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Synergistic efficacy of 405nm light and chlorinated disinfectants for the enhanced decontamination of Clostridium difficile spores

机译:405nm光照和氯化消毒剂对艰难梭菌孢子增强去污的协同功效

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摘要

The ability of Clostridium difficile to form highly resilient spores which can survive in the environment for prolonged periods causes major contamination problems. Antimicrobial 405 nm light is being developed for environmental decontamination within hospitals, however further information relating to its sporicidal efficacy is required. This study aims to establish the efficacy of 405 nm light for inactivation of C. difficile vegetative cells and spores, and to establish whether spore susceptibility can be enhanced by the combined use of 405 nm light with low concentration chlorinated disinfectants. Vegetative cells and spore suspensions were exposed to increasing doses of 405 nm light (at 70–225 mW/cm2) to establish sensitivity. A 99.9% reduction in vegetative cell population was demonstrated with a dose of 252 J/cm2, however spores demonstrated higher resilience, with a 10-fold increase in required dose. Exposures were repeated with spores suspended in the hospital disinfectants sodium hypochlorite, Actichlor and Tristel at non-lethal concentrations (0.1%, 0.001% and 0.0001%, respectively). Enhanced sporicidal activity was achieved when spores were exposed to 405 nm light in the presence of the disinfectants, with a 99.9% reduction achieved following exposure to 33% less light dose than required when exposed to 405 nm light alone. In conclusion, C. difficile vegetative cells and spores can be successfully inactivated using 405 nm light, the sporicidal efficacy can be significantly enhanced when exposed in the presence of low concentration chlorinated disinfectants. Further research may lead to the potential use of 405 nm light decontamination in combination with selected hospital disinfectants to enhance C. difficile cleaning and infection control procedures.
机译:艰难梭菌形成高弹性孢子的能力可以在环境中长期生存,这引起了严重的污染问题。正在为医院内部的环境净化开发405 nm抗菌光,但是需要有关其杀菌效力的更多信息。这项研究旨在确定405 nm光对灭活艰难梭菌营养细胞和孢子的功效,并确定是否可以通过将405 nm光与低浓度氯化消毒剂结合使用来增强孢子敏感性。将营养细胞和孢子悬浮液暴露于增加剂量的405 nm光(70-225 mW / cm2)下,以建立敏感性。剂量为252 J / cm2时,营养细胞数量减少了99.9%,但是孢子显示出更高的弹性,所需剂量增加了10倍。暴露于非致死浓度(分别为0.1%,0.001%和0.0001%)的孢子悬浮在医院消毒剂次氯酸钠,Actichlor和Tristel中重复进行。当孢子在消毒剂的存在下暴露于405 nm光线下时,杀孢活性增强,与单独暴露于405 nm的光线相比,暴露于33%的光剂量后孢子减少了99.9%。总之,使用405 nm的光可以成功地使艰难梭菌的营养细胞和孢子失活,当暴露于低浓度的氯化消毒剂中时,杀孢子的功效可以显着增强。进一步的研究可能会导致与选定的医院消毒剂结合使用405 nm光去污技术,以增强艰难梭菌的清洁和感染控制程序。

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